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When it comes
to diamonds, size is crucial. For emerging industrial applications,
researchers have discovered, smaller is better.
Research into
ultrananocrystalline
diamond (UNCD) films, whose
grains are measured in billionths of a meter, and the technology
for creating them has opened up an array of opportunities not
possible using old diamond film technologies that produce grains
1,000 times
larger. Potential applications range from low-friction coatings
to diamond electronics and biosensors.
Using a new
patented plasma-enhanced chemical vapor deposition process, which
won an R&D 100 award,
Argonne researchers can deposit thin films of carbon atoms
in a true diamond crystalline
structure at relatively low temperatures — 400
degrees Celsius (750 degrees Fahrenheit) or lower. Earlier
methods
required 800°C (1,470°F) or higher. The resulting thin
film has the same
properties of hardness, conductivity, etc. as single crystal
diamonds.
Because of
the lower deposition temperatures, the UNCD films can be applied
to a greater variety of substrates,
including
those
containing microelectronic devices, than can other diamond
films. The process reduces thermal stress at the interface
and deposits
continuous, uniform diamond films over large areas at rates
of about one micrometer (millionth of a meter) per hour.
Continuous
UNCD films can be grown to thicknesses from 100 nanometers
(billionths of a meter) to 30 micrometers. They
are very smooth
as deposited, with low surface adhesion and a small coefficient
of friction.
Structurally,
the film’s grains are
only 3 to 5 nanometers in size, setting UNCD apart from
rougher thin films. These properties
are being applied in low-friction coatings to decrease
energy use in mechanical pumps and other rotating equipment.
Wear tests conducted
on UNCD-coated silicon carbide pump seals showed no detectable
wear, while standard seals need replacing.
By changing
the plasma chemistry, the electrical conductivity of UNCD can
be controlled, ranging from insulating to
highly conductive.
This is done by introducing nitrogen gas into the plasma.
UNCD films show high electron emission at low voltage
and can be
used to make a new generation of field-emission devices
for such applications
as flat-panel displays for televisions and computers.
UNCD
is chemically inert and hydrophobic, or water resistant. It
is also compatible with biological tissues.
This has
led to progress
toward developing artificial retinas to correct some
forms of blindness (Diamond
films may help restore sight).
Films are flexible
Protective UNCD films can be applied in smooth layers
that conform to the shape of a substrate, such
as a computer chip with embedded
circuitry. The films can be patterned using traditional
integrated manufacturing methods developed for
making microcircuits,
providing a basis for new microelectromechanical
systems, known as MEMS.
UNCD permits MEMS to be more reliable, thermally
stable, and resistant to corrosion; to be built
on many substrates;
and
to have superior
wear capabilities and low friction.
More recent
work has shown that UNCD films can be used to make a biosensor
sensitive enough to
detect
the
presence of a single
molecule. This is possible because the surface
chemistry of UNCD can be finely controlled, allowing
selective
absorption of biomolecules
such as DNA fragments and proteins. This has
important implications
for national security.
Initial technology,
patented in 1991 by Dieter Gruen, an Argonne senior scientist
in materials
science,
led to synthesis,
characterization
and development of UNCD film. Follow-up development
by the research team in the Materials
Science Division has
been
supported by
the Department
of Energy’s Basic Energy
Sciences, the Office
of Industrial Technology,
the Office
of Biological and Environmental
Research, and Defense
Advanced Research Projects Agency.
For more information,
please contact Richard Greb.
Next: Diamond
films may help restore sight
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