Argonne National Laboratory

Wafer-Scale and Cleanroom-Based Nanofabrication

Wafer-Scale and Cleanroom-Based Nanofabrication

The Center for Nanoscale Materials operates a 12,000 sq. ft. class 100 cleanroom with comprehensive lithographic, deposition, etching, and metrology suites for wafer-scale fabrication.

Researchers at the CNM are pioneering new nanofabrication techniques to better integrate of hybrid materials and nanostructures. This integration enables the synthesis of hybrid materials designed to elucidate the relationship between nanostructure and functionality. CNM researchers develop methods to incorporate hybrid materials into novel structures and devices to enhance their performance and range of use.

Nanofabrication facilities available in the CNM cleanroom for these purposes include:

Lithography Suite: Electron beam, ion beam, direct write optical, nanoimprint, and holographic lithography capabilities, as well as contact printing with back-side alignment.

Deposition Suite: Multi-chamber sputtering tools, electron beam evaporation, and plasma-enhanced chemical vapor deposition for production of dielectric and metal films. Also, microwave-plasma chemical vapor deposition for production of diamond films and an Atomate system for production of carbon nanotubes and graphene.

Wet Etch Bay: Electroplating, an electrochemical workstation, and supercritical drying capability for postprocessing, including a dual-chamber Oxford Instruments Plasmalab 100 and two tabletop March Plasma reactive ion etchers. Also, various metrology tools, including profilometers, a spectroscopic ellipsometer, and an atomic force microscope.

Biohazard Level-2 Biobay: Enabling functionalization of surfaces with biomolecules without breaking device cleanliness protocol.