Jeffrey Elam

Chemist
- Energy Systems

Jeffrey Elam is an Argonne chemist who founded and directs Argonne’s atomic layer deposition (ALD) research program. The program, which includes R&D as well as commercialization, studies ALD as a method with the potential to boost the power of photovoltaic solar cells.

In 2008 he and his team won the R&D 100 award for research in ultrananocrystalline diamond mechanical seals.

Awards, Honors, and Memberships

  • R&D 100 Award (2012) “Large Area Microchannel Plates”
  • R&D 100 Award (2008) “Ultrananocrystalline Diamond (UNCD) Mechanical Seals”
  • Member, Argonne-Northwestern Solar Energy Research Center (ANSER); Argonne Center for Electrical Energy Storage (CEES); Institute for Atom-Efficient Chemical Transformations (IACT)

Publications & Patents

  • C. P. Canlas, J. Lu, N. Ray, N. Grosso-Giordano, S. Lee, J. W. Elam, R. E. Winans, R. P. Van Duyne, P. C. Stair, and J. M. Notestein, “Shape-Selective Sieving Layers on an Oxide Catalyst Surface”, Nature Chemistry, 4, 1030-1036 (2012).
  • E. Thimsen, S. C. Riha,  S. V. Baryshev, A. B.F. Martinson, J. W. Elam and M. J. Pellin, “Atomic layer deposition of the quaternary chalcogenide Cu2ZnSnS4”, Chemistry of Materials, 24 (16), 3188-3196 (2012).
  • D. J. Comstock and J. W. Elam, “Atomic layer deposition of Ga2O3 films U.S.ing trimethylgallium and ozone”, Chemistry of Materials, 24, 4011-4018, (2012).
  • Y.-C. Tseng, A. U. Mane , J. W. Elam , and S. B. Darling, “Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early”, Advanced Materials, 24, 2608-2613, (2012).
  • A. Yanguas-Gil and J. W. Elam, “Simple model for atomic layer deposition precursor reaction and transport in a viscoU.S.-flow tubular reactor”, J. Vac. Sci. Technol. A, 30 (1), 01A159-1-01A159-7, (2012).
  • O.H.W. Siegmund, J.B. McPhate, S.R. Jelinsky, J.V. Vallerga, A.S. Tremsin, R. Hemphill, H.J. Frisch, R.G. Wagner, J. Elam, and A. Mane, “Development of Large Area Photon Counting Detectors Optimized for Cherenkov Light Imaging with High Temporal and sub-mm Spatial Resolution”, IEEE Transactions, 2063-2070, (2011).
  • Y. Lei, B. Liu, J. Lu, R. Lobo, T. Wu, H. Feng, X. Xia, A. U. Mane, J. A. Libera, J. P. Greeley, J. T. Miller and J. W. Elam, “Synthesis of Pt-Pd Core-Shell Nanostructures by Atomic Layer Deposition: Application in Propane Oxidative Dehydrogenation to Propylene”, Chemistry of Materials, 24 (18), 3525–3533, (2012).
  • J. Lu, B. Fu, M. C. Kung, G. Xiao, J. W. Elam, H. H. Kung, and P. C. Stair, “Coking and Sintering Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition”, Science, 335, 1205 (2012).
  • J. Lu, Y. Lei, and J. W. Elam, “Atomic Layer Deposition of Noble Metals – New Developments in Nanostructured Catalysts”, in “Noble Metals”, Y. –H. Su, ed., InTech, ISBN: 978-953-307-898-4 , (2012).
  • J. W. Elam, N. P. Dasgupta, and F. B. Prinz, “ALD for clean energy conversion, utilization, and storage”, MRS Bulletin,  36, 899-906, (2011).
  • J. W. Elam, “Coatings on High Aspect Ratio Structures”, in “Atomic Layer Deposition of Nanostructured Materials”, N. Pinna and M. Knez, eds., Wiley-VCH, (2011).
  • J. M. P. Alaboson, Q. Hua Wang, J. D. Emery, A. L. Lipson,  M. J. Bedzyk, J. W. Elam, M. J. Pellin, and M. C. Hersam, “Seeding Atomic Layer Deposition of High-k Dielectrics on Epitaxial Graphene with Organic Self-Assembled Monolayers”, ACS Nano, 5 (6), 5223-5232 (2011).
  • Y.-C. Tseng, Q. Peng, L. Ocola, J. W. Elam, and S. B. Darling, “Enhanced Block Copolymer Lithography U.S.ing Sequential Infiltration Synthesis”, J Phys Chem C., 115(36) 17725-17729 (2011).
  • A. Yanguas-Gil and J. W. Elam, “Controlled dopant distribution and higher doping efficiencies by surface-functionalized atomic layer deposition”, Chemistry of Materials, 23 (19), 4295-4297, (2011).
  • J. A. Libera, J. N. Hryn, and J. W. Elam, “Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water”, Chemistry of Materials, 23 (8), 2150–2158 (2011).
  • S. T. Christensen and J. W. Elam, “Atomic layer deposition of Ir-Pt alloy films”, Chemistry of Materials, 22, 2517–2525, (2010).
  • “Microchannel Plate Detectors and Methods for Their Fabrication”, U.S. Patent application  2012/0187305 A1.
  • “Ordered Nanoscale Domains by Infiltration of Block Copolymers”, U.S. Patent application 2012/0046421 A1.
  • “Atomic Layer Deposition for Functionalizing Colloidal and Semiconductor Nanoparticles”, U.S. Patent Number 8,012,860.
  • “Heterojunction Photovoltaics Assembled With Atomic Layer Deposition”, U.S. Patent Number 8,258,398.