Atomic Layer Deposition for the Synthesis and Integration of 2-D Materials for Nanoelectronics and Catalysis
Abstract: Graphene and other layered 2-D materials have been the focus of intense research in the last decade because of their unique physical and chemical properties. This presentation will highlight our recent progress in the synthesis and integration of 2-D materials for nanoelectronics and catalysis applications using atomic layer deposition (ALD). ALD is a chemical process that is based on self-limiting surface reactions and results in ultrathin films, with sub-nanometer control over the thickness and wafer-scale uniformity.
In the first part of this presentation, I will focus on the fabrication of low-resistance contacts and ultrathin dielectrics to graphene using ALD. In the second part I will show how we use plasma-enhanced ALD to synthesize large-area 2-D transition metal dichalcogenides with tuneable functionalities for nanoelectronic and catalysis applications.