Upcoming Events

Fabrication of High-aspect-ratio Nano-structures for X-ray Microscopy Applications

April 23, 2013 11:00AM to 12:00PM
Presenter 
Ming Lu, Brookhaven National Laboratory
Location 
Building 401, Room A1100
Type 
Seminar
Series 
XSD/OPT Special Presentation
Abstract:
Recent efforts of x-ray microscopy research and development are pushing the resolution of state-of-the-art x-ray microscopes toward single digit of nanometer region. Among all the x-ray focusing optics, Fresnel zone plates are superior considering their nature of two-dimensional focusing and a resolution close to diffraction limit. However, high-resolution zone plates operated at x-ray wavelengths, especially in hard x-ray region, require a high-aspect-ratio geometry for their concentric metal zones to efficiently diffract lightwave, a challenge to nanofabrication researchers.

In this talk, I will discuss three different approaches for fabricating high-aspect-ratio metallic nanostructures, including methods utilizing stressless electroforming molds, double-patterning, and zone-doubling techniques. Using these techniques we demonstrated hard-x-ray zone plates with 19:1 aspect-ratio and 30 nm outermost zone width, as well as a platinum resolution test pattern featuring 17-nm-wide, 255-nm-tall gratings.