Upcoming Events

Surfaces Functionalization by Atomic Layer Deposition: From Superconducting RF Cavities to Controlling Doping

September 5, 2013 11:00AM to 12:00PM
Presenter 
Thomas Proslier (MSD)
Location 
Building 212, Room A157
Type 
Colloquium
Series 
Materials Science Colloquium
Abstract:
Atomic Layer deposition is a very powerful and recent synthesis technique that offers unequaled level of control of materials' composition and structures on arbitrary complex-shape substrates. To illustrate these unique properties I'll present an overview of the two main thrusts that emerged from our last 3 years' work: The first research direction aims at reducing drastically the cost of particle accelerators by using new superconducting materials and meta-structures with scalable-non line of sight deposition techniques.

This project encompasses a broad variety of subjects: from understanding the surface dissipation of superconductors under strong RF field to explore the synthesis by ALD of superconducting thin films and their properties. The second research direction aims at achieving an unprecedented level of 3 dimensional doping control by atomic layer deposition and I'll present the results we obtained on a model system: Er doped Y2O3 for fiber laser applications.