Argonne National Laboratory

Ordered Nanoscale Domains by Infiltration of Block Co-Polymers

Technology available for licensing: The invention is a method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may use sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD).


  • Tunable inorganic features can be selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant.
  • The organic component may be optionally removed to obtain inorganic features with patterned nanostructures defined by the configuration of the microdomain.


Patent Application # 13/209,190