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Center for Nanoscale Materials

APS/CNM Users Meetings

The APS/CNM Users Meeting has been cancelled due to the COVID-19/coronavirus outbreak.

The action to cancel the APS/CNM Users Meeting is being taken to protect the health of all attendees and the wellbeing of our entire community. We are taking this action out of an abundance of caution. No Argonne staff members have tested positive for COVID-19.

All paid registration fees, lunch tickets, and banquet tickets will be refunded in full to registered attendees. Registration fees for Argonne National Laboratory staff who paid using the XINK system will be reversed.

We apologize for this disruption to your plans. Thank you for your understanding. We hope that you will rejoin us in 2021. Please contact us with any questions at apsuser@​anl.​gov.

2020 Perfect Vision

APS/CNM Users Meeting

April 20-24, 2020

The annual joint users meetings of the Center for Nanoscale Materials (CNM) and the co-located Advanced Photon Source (APS) are held at Argonne National Laboratory. Anyone is welcome to register for these meetings, which attract more than 400 registrants plus 50+ vendor booths for myriad activities including technical workshops that highlight, promote, and stimulate user science; plenary sessions; poster sessions; a vendor expo; social events; and CNM short courses. A Best Student Poster Award competition is held for students who benefit from accessing the CNM.

Main meeting website link

CNM Plenary Session CANCELLED

Monday afternoon, April 20, APS Conference Center

Moderator:  CNM Users Executive Committee

  • CNM KEYNOTE: 1:30 pm  Stephen Forrest, University of Michigan
    Peter A. Franken Dist. Prof. of Engin., Paul G. Goebel Prof. of Engin., Prof. of EECS, Physics, and MS&E
    Title TBD
  • 2:15 pm  Alex Martinson, Argonne National Laboratory
    Chemist, Materials Science Division
    Few-Atom Cluster Arrays via Atomic Layer Deposition for Solar Fuels Catalysis”
  • 3:00 pm  Break
  • 3:20 pm  Chair, CNM Users Executive Committee
    Update from the CNM Users Executive Committee
  • 3:30 pm  Haiyan Wang, Purdue University
    Basil S. Turner Professor of Engineering 
    Large-scale Plasmonic Hybrid Metamaterials via Vertically Aligned Nanocomposite (VAN) Designs”
  • 4:00 pm Arun Kumar Mannodi Kanakkithodi, Argonne National Laboratory
    Distinguished Young Investigator, Nanoscience and Technology Division
  • 4:30 pm Invited Student Talk
  • 4:45 pm Adjourn
  • Meeting Banquet at The Monte Bello Estate


Tuesday, April 21

CNM Workshop (WK2): Hybrid Quantum Systems

  • Co-organizers:  Xu Han, Dafei Jin, and Xufeng Zhang (CNM)
  • Agenda TBD

Joint APS/CNM Workshop (WK4): Autonomous Control of Experiments in the Microscopes and Light Sources of the Future

  • Co-organizers: Mathew Cherukara and Subramanian Sankaranarayanan (CNM), Nicholas Schwarz and Chengjun Sun (APS)
  • Agenda TBD


Wednesday, April 22

Joint APS/CNM Workshop (WK5): Advances in Phase Retrieval Methods for High-Resolution X-ray Imaging

  • Co-organizers: Saugat Kandel (Northwestern University), Siddharth Maddali (ANL/MSD), and Ming Du (APS)
  • Agenda TBD

CNM Workshop (WK7): Artificial Intelligence for Autonomous Synthesis and Processing 

  • Co-organizers: Pierre Darancet, Xiao-Min Lin, and Subramanian Sankaranarayanan, and Jie Xu (CNM), Hua Zhou (APS), and Logan Ward (ANL/DSL)
  • Agenda TBD


Thursday, April 23

$25 fee in addition to meeting registration fee

Short Course A:  Fundamentals of High Aspect Ratio Pattern Transfer by Deep Reactive Ion Etching (DRIE) Processes
Description:  This course will discuss and demonstrate pattern transfer by dry etch DRIE.  The applications of these processes are the transfer of 2D patterns in thin films and substrates and the micro- and nanofabrication of 3D structures in substrates. This course will also present new complementary technologies such as Fast Atomic Sequential Technology (FAST) and stripping and cleaning technologies. 

Instructors:  Ralu Divan and Thomas Cecil
Lecturer:  Dr. Pratik Kothary (PlasmaTherm)
Time:  8:30 a.m. – 12:00 p.m.  
Location:  Building 440A105
Max Attendees: 10
Note:  Attendees can bring samples.  Scanning Electron Microscopy (SEM) will be done for etched samples upon requested.  

Short Course B:  Introduction to Confocal Raman Spectroscopy
Description:  A hands-on demonstration of the capabilities of the CNM’s confocal Raman microscopes will be presented.  Subjects to be discussed and demonstrated include the following:
•    Basic Raman spectroscopy concepts
•    Anatomy of a confocal Raman microscope
•    Sample preparation
•    Simple spectra collection
•    Effects of excitation wavelength
•    Point mapping
•    Line/area mapping
•    Heating and cooling samples

Instructor:  Dave Gosztola
Time:  8:30 a.m. – 12:00 p.m.  
Location:  Building 440B108.  Please note:  Attendees should meet in the CNM Lobby.
Max Attendees: 8
Note:  Attendees are encouraged to bring a sample of interest; please contact instructor David Gosztola prior to arrival for information on sample limitations.

Short Course C:  Using the Hard X-ray Nanoprobe
Description:   This course will consist of a functional overview of the nanoscale hard X-ray microscopy capabilities at the CNM/APS Hard X-ray Nanoprobe beamline. A step-by-step description of the basic experimental process steps including sample requirements, sample preparation, alignment, data collection, and data analysis will be provided through the use of demonstration experiments and data. A survey of recent literature and current experimental directions will also be presented to highlight the scientific impact of these unique imaging capabilities. This course is targeted for potential CNM users interested in a working understanding of the experimental strengths and functional requirements of the nanoprobe instrument. Topics will include the following:
•    Scanning x-ray fluorescence microscopy
•    Scanning x-ray diffraction microscopy
•    Bragg projection ptychography

Instructor: Martin Holt
Time: 9:00 a.m. - 12:00 p.m.
Location: Sector 26 Control Room
Max Attendees: 12

Short Course D - Thin Film Deposition Overview
Description:  This course is designed as an introduction to fundamental concepts and operating principles for the deposition of thin films by physical vapor deposition or chemical methods, providing a broad overview of thin film deposition methods, their advantages and limitations. Understanding that all methods have their specific limitations and involve compromises with respect to process specifics and substrate material, helps determining the methods that are suitable for achieving the expected film properties. Deposition methods that are available at the Center for Nanoscale Materials (CNM) - sputtering, evaporation, ALD, and CVD - will be discussed in more detail.

Instructor:  Liliana Stan
Time: 8:30 a.m. - 12:00 p.m.
Location: Bldg. 440, A106
Max Attendees: 12