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Center for Nanoscale Materials

APS/CNM Users Meetings

May 3-14, 2021, APS/CNM Joint Virtual Users Meeting 


The annual joint users meeting of the Center for Nanoscale Materials (CNM) and the co-located Advanced Photon Source (APS) was held virtually in 2021 by Argonne National Laboratory. Anyone was welcome to register for myriad activities including technical workshops that highlight, promote, and stimulate user science; plenary sessions; poster sessions; a vendor expo; and CNM short courses.


Sophie Canton (XFEL, Germany), Karen Mulfort (CSE Argonne), Kamal Soni (Corning, Inc.)

CNM BEST STUDENT POSTER PRIZE: Ariel Leonard, Northwestern University Photophysical Implications of Ring Fusion, Linker Length, and Twisting Angle in a Series of Perylenediimide-Thienoacene Dimers”

Joint APS/CNM Plenary Session

Monday morning, May 10

  • DOE UPDATELinda Horton, Associate Director of Science for DOE Basic Energy Sciences
  • CNM FACILITY STATUS UPDATE: Ilke Arslan, Director, Center for Nanoscale Materials 

CNM Plenary Session

Monday afternoon, May 10

Moderator:  Jean-Luc Ayitou - Vice-Chair, CNM Users Executive Committee

  • CNM KEYNOTE: 1:30 pm  Stephen Forrest, University of Michigan
    Professor of Electrical Engineering & Computer Science, Physics and Materials Science & Engineering
    Organic Heterojunctions: A Platform for Understanding and Controlling the Optical and Electronic Properties of Disordered Materials”
  • 2:15 pm  Alex Martinson, Argonne National Laboratory
    Materials Science Division
    Towards Precision Inorganic Clusters: Sequential Infiltration Synthesis, Atomic Structure and Conductivity”
  • 3:00 pm  Break
  • 3:20 pm  CNM Users Executive Committee
    Update from the CNM Users Executive Committee
    User Town Hall (Topics: Input on Future Capabilities; Writing a Successful CNM User Proposal)
  • 4:30 pm Adjourn  

CNM Workshops

Collaborative Opportunities for Industry to Partner with CNM 

  • Monday, May 3, all day
  • Co-organizers:  Anirudha Sumant (CNM) and TBD

Hybrid Quantum Systems 

  • Thursday, May 13 and Friday, May 14
  • Co-organizers:  Xu Han (CNM), Dafei Jin (CNM), and Xufeng Zhang (CNM)

Joint APS/CNM Workshops

Interpreting Hierarchical Data at Nanocenters and X-ray User Facilities 

  • Tuesday, May 4, all day
  • Co-organizers:  Yue Cao (APS), Maria K. Chan (CNM), Mathew Cherukara (APS), Wendy Di (MCS)

Applications of AI/ML to Real-time Multi-modal Analysis for Light Sources and Electron Microscopy  

  • Wednesday, May 5 and Thursday, May 6, mornings
  • Co-organizers:  Mathew Cherukara (APS), Subramanian Sankaranarayanan (CNM), Chengjun Sun (APS), and Nicholas Schwarz (APS)

Dynamics in Soft Matter with Emphasis on Complex Fluids (XPCS

  • Tuesday, May 11 and Wednesday, May 12, mornings
  • Co-organizers:  Xiao-Min Lin (CNM), Suresh Narayanan (APS), and Qingteng Zhang (APS)

Joint APS/CNM Poster Session

Tuesday afternoon, May 11


CNM Short Courses

Overview of Thin Film Deposition Methods at CNM 

  • Wednesday, May 5, afternoon
  • Instructor:  Liliana Stan (CNM)
  • This course introduces fundamental concepts and operating principles for the deposition of thin films by physical vapor deposition or chemical methods, providing a broad overview of thin film deposition methods, their advantages, and limitations. Understanding all methods, with their specific limitations and compromises with respect to process specifics and substrate materials, helps in determining the methods that are suitable for achieving the expected film properties. Deposition methods that are available at the Center for Nanoscale Materials include sputtering, evaporation, atomic layer deposition (ALD), and chemical vapor deposition (CVD), and these will be discussed in detail.