Argonne National Laboratory

Colloquium Series

The Center for Nanoscale Materials holds a regular biweekly colloquium on alternate Wednesdays at 11:00 a.m. in Bldg. 440, Room A105/106. The goal of the series is to provide a forum for topical multidisciplinary talks in areas of interest to the CNM and also to offer a mechanism for fostering interactions with potential facility users.

Committee Members:

  • Xiao-Min Lin (Chair)
  • Pierre Darancet
  • Ralu Divan
  • Xuedan Ma
  • Elena Rozhkova
  • Jianguo Wen

Nov. 15, 2017 

Directed Self-Assembly of Performance Materials,  Paul Nealey, Institute for Molecular Engineering/University of Chicago/Argonne National Laboratory, Host: Xuedan Ma

Directed self-assembly is arguably the most promising strategy for high-volume cost-effective manufacturing at the nanoscale.  Over the past decades, manufacturing techniques have been developed with such remarkable efficiency that it is now possible to engineer complex systems of heterogeneous materials at the scale of a few tens of nanometers. Further evolution of these techniques, however, is faced with difficult challenges not only in feasibility of implementation at scales of 10 nm and below, but also in prohibitively high capital equipment costs. Materials that self-assemble, on the other hand, spontaneously form nanostructures down to length scales at the molecular scale, but the micrometer areas or volumes over which the materials self-assemble with adequate perfection in structure is incommensurate with the macroscopic dimensions of devices and systems of devices of industrial relevance.  Directed Self-Assembly (DSA) refers to the integration of self-assembling materials with traditional manufacturing processes.  The key concept of DSA is to take advantage of the self-assembling properties of materials and at the same time meet the constraints of manufacturing.  Put another way, DSA enables current manufacturing process capabilities to be enhanced and augmented at drastically reduced cost. Here I will discuss the use of lithographically-defined chemically patterned surfaces to direct the assembly of block copolymer films for semiconductor manufacturing and the design of ion-conducting membranes for energy applications, liquid crystal based systems for optoelectronics, and nanoparticles for applications in nanophotonics.  In addition, I will highlight how DSA of these systems enables new strategies and techniques for characterization and optimization of both materials and processing conditions.

Dec. 13, 2017 Norbert Scherer, University of Chicago, Host: Xiao-Min Lin
Jan. 10, 2018 Tim Berkelbach, University of Chicago.  Host: Pierre Darancet
Jan. 24, 2018 Kathleen J. Stebe, University of Pennsylvania, Host: Xiao-Min Lin
Feb. 7, 2018 Pierre-Nicholas Roy, University of Waterloo, Host: Stephen Gray
Feb. 21, 2018 Alexandra Boltasseva, Purdue University, Host: Gary Wiederrecht
Apr. 18, 2018 Nicholas A. Kotov, University of Michigan.  Host:  Gleiciani de Queiros Silveira
May 2, 2018 David S. Ginger, University of Washington, Host: Pierre Darancet
May 16, 2018 Gong Gu, University of Tennessee, Host: Lifen Wang
May 30, 2018 Yugang Sun, Temple University.  Host:  Gary Wiederrecht
Jun. 13, 2018 Mike Arnold, University of Wisconsin, Host: Nathan Guisinger
Jun. 27, 2018 James Alexander Liddle, National Institute of  Standards and Technology (NIST), Host: Ralu Divan
Jul. 11, 2018  
Jul. 25, 2018