Argonne National Laboratory

2007 CNM Users Meeting

Wednesday, May 9, 2007
7:00-10:00 p.m. Joint User Facilities Banquet
Thursday, May 10, 2007
9:00 a.m.-4:30 p.m.

Workshops

Workshop 8. Hard X-Ray Nanoprobe (CNM/APS)
Jörg Maser (CNM/APS), Brian Stephenson (MSD/CNM), Stephen Streiffer (CNM)

Workshop 9. Nanotomography (CNM/EMC/APS)
Derrick Mancini (CNM), Bernd Kabius (EMC), Mark Rivers (APS/UChicago)

Workshop 10. Synthesis and Self-Assembly of Nanomaterials (CNM)
Xiao-Min Lin (CNM), Moonsub Shim (UIUC)

Workshop 11. NanoElectronics (CNM)
Mark Eriksson (UW-Madison), Nikolai Zhitenev (Bell Labs)

4:30-6:30 p.m.

Poster Session and Reception
CNM Facility Tour (5:00-6:00 p.m.)

(All posters can be set up for the entire week in APS LOM 437.)

6:45 p.m. CNM Banquet
Argonne Guest House
Friday, May 11, 2007
(All events will be held in the APS 402 Lecture Hall)
Keynote Session
8:30-8:35 a.m. Welcome, Paul Evans, Chair, CNM Users' Executive Committee
8:35-8:45 a.m. Welcome from Argonne’s Directorate
Dr. Al Sattelberger
Associate Laboratory Director for Physical Sciences
Acting Associate Laboratory Director for Applied Sciences & Technology
8:45-9:30 a.m. Federal and DOE Perspectives on Nanoscience and Nanotechnology
Dr. Altaf H. Carim, Program Manager
Scientific User Facilities Division, DOE-BES
9:30-10:15 a.m. Center for Nanoscale Materials Update, Eric D. Isaacs
10:15-10:30 a.m. Break
10:30-11:15 a.m.

Nanomaterials in Energy Storage: Recent Achievements & Future Prospects
Prof. Yet-Ming Chiang, Kyocera Professor Ceramics
Dept. of Materials Science & Engineering
Massachusetts Institute of Technology

11:15 -12:00 noon Nanomaterials and Grand Challenges in Medicine
"Cancer Nanotechnology: An Opportunity for a New Class of Diagnostic and Therapeutic Solutions"
Dr. Larry Nagahara, Nanotechnology in Cancer, Office of the Director, National Cancer Institute
12:00 -1:15 p.m. Lunch
Plenary Session
1:15-1:50 p.m.

“Functionalized carbon nanostructures: Synthesis and applications in photovoltaics and biology,”
Dirk Guldi, Institute of Physical Chemistry
University of Erlangen-Nürnberg, Germany

1:50 - 2:25 p.m. “Temporally and Spatially Resolved Solar Energy Flow in 2D and 3D Photosynthetic Structures,”
Libai Huang, Center for Nanoscale Materials
Argonne National Laboratory
2:25 - 3:00 p.m. “Exciton-Exciton Interactions in Semiconductor Nanocrystals from the Perspective of Solar-Energy Conversion,”
Victor Klimov, Softmatter Nanotechnology and Advanced Spectroscopy Team
Los Alamos National Laboratory
3:00 - 3:15 p.m. Break
3:15 - 3:50 p.m. “Solid-State Lighting: Recent Advances and Current Challenges,” Anneli Munkholm, Phillips Lumileds Lighting Company
3:50 - 4:25 p.m.

“Manipulating Nanomagnets Using Spin-Transfer Torques,”
Daniel Ralph, Laboratory of Atomic and Solid-State Physics
Cornell University

4:25 - 5:00 p.m. "Quasi-Three-Dimensional Plasmonic Crystals,”
John Rogers, Department of Materials Science and Engineering
University of Illinois at Urbana-Champaign
5:00 - 5:15 p.m. Announcement of New CNM UEC Members, Paul Evans
Saturday, May 12, 2007
Short Courses (limited registration)
[registration for the User Meeting is required (either M-F or Th-F);
1/2-day sessions are repeated in the afternoon]

8:30 a.m.– 12:00 noon

Lunch: 12:00 – 1:00

1:00 – 4:30 p.m.

A. Electron-Beam Lithography for Beginning Users
For novice or potential users who have little or no hands-on experience, this course will concentrate on learning the Raith 150, 30 -kV electron lithography system. With an easy-to-follow Windows interface, this mid-sized tool can deliver 12-nm features. It also serves as our cleanroom scanning electron microscope.

B. Electron-Beam Lithography for Intermediate Users
For users with some hands-on experience, this course will concentrate on the advanced JEOL 9300 instrument. The JEOL9300FS 100-keV electron lithography system provides capability of reproducibly achieving feature sizes below 10 nm. This state-of-the-art tool has a 1-nm address grid over a complete 1-mm field size. Pattern placement errors are in the single-digit nanometers, and the system can handle samples from small pieces to 8-inch wafers.

C. Focused Ion Beams for Nanofabrication
Focused ion beam systems use a finely focused beam of gallium ions operated at low-beam currents for imaging and at high-beam currents for site-specific milling. Their versatility makes them popular for a wide variety of applications, including advanced circuit edititing and revealing below-the-surface defects in advanced materials and devices. This tool complements the two electron-beam tools.