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Wafer-Scale and Cleanroom-Based Nanofabrication

The Center for Nanoscale Materials (CNM) operates a 17,000-square-foot class 100 and 1,000 cleanroom with comprehensive lithographic, deposition, etching and metrology suites for wafer-scale fabrication.

Researchers at the CNM are pioneering new nanofabrication techniques to better integrate hybrid materials and nanostructures. This integration enables the synthesis of hybrid materials designed to elucidate the relationship between nanostructure and functionality. CNM researchers develop methods to incorporate hybrid materials into novel structures and devices to enhance their performance and range of use.

CNM cleanroom nanofabrication facilities include the following:

Lithography Suite: Electron beam, ion beam, direct write optical, nanoimprint and holographic lithography capabilities, as well as contact printing with back-side alignment

Deposition Suite: Multi-chamber sputtering tools, electron beam evaporation and plasma-enhanced chemical vapor deposition for production of dielectric and metal films. Also, microwave-plasma chemical vapor deposition for production of diamond films and an Atomate system for production of carbon nanotubes and graphene

Wet Etch Bay: Electroplating, an electrochemical workstation, and supercritical drying capability for postprocessing, including a dual-chamber Oxford Instruments Plasmalab 100 and two tabletop March Plasma reactive ion etchers. Also, various metrology tools, including profilometers, a spectroscopic ellipsometer, and an atomic force microscope

Biohazard Level-2 Biobay: Enabling functionalization of surfaces with biomolecules without breaking device cleanliness protocol

CNM Clean Room Video Celebrates National Nanotechnology Day: In the video below, David Czaplewski narrates an overview of select nanofabrication projects taking place in the CNM clean room facility.