Abstract: EUV (Extreme Ultraviolet) lithography has been one of the most important tools that enables the continuation of semiconductor scaling and densification. In this talk, the EUV basic functions, generating the smallest patterns required for the next generation logic/memory chip manufacturing, and the next step – high NA EUV - will be briefly described. Then, the challenges on the development of EUV photoresist materials, such as LWR trade-off, stochastic effect, pattern uniformity, etc., will be introduced. And the exemplary photoresist under development to meet the requirement for the low-NA EUV extension and high-NA EUV will be discussed.
Bio: Hyung Ju Ryu has research interest on the advanced patterning process and material development. He is a principal engineer at the process development team in Samsung Electronics Semiconductor R&D center. Previously, he worked as a senior manager at LG Chem and was a postdoctoral scholar at the University of Chicago. He obtained his Ph.D. from the Materials Science and Engineering Department at Carnegie Mellon University and his Bachelor Degree from Yonsei University in Korea.