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Colloquium | Materials Science

Pioneering Nanomaterials and Nanodevices through Direct Atomic Layer Processing for Advanced Applications

Joint MSD & Microelectronics Colloquium

Abstract: As the demand for cutting-edge, resilient, and dependable technologies intensifies across various industries, our company stands at the forefront of developing sophisticated materials and devices by harnessing the unique potential of Atomic Layer Deposition (ALD) and Atomic Layer Processing for targeted 3D processing and printing. This presentation will deliver a comprehensive analysis of our groundbreaking technology, its prospective influences on a wide range of applications, and its alignment with Argonne National Lab’s research focus on nanomaterials and nanodevices. 

Our innovative Spatial ALD micronozzles and microreactor Direct Atomic Layer Processing (μDALP) technology empower us to tackle the challenges associated with miniaturization, consequently enabling a vast array of applications in various fields. We have achieved substantial progress in refining the μDALP resolution, enhancing material capabilities and accessible morphologies, and introducing new instruments. Our recent efforts demonstrate the development of diverse materials, processes, structures, and devices crucial for functional electronics, sensing, and photonics applications. 

These advancements present unrivalled benefits in terms of durability, dependability, and adaptability across various sectors, including quantum devices, MEMS, display technology, RF electronics, emerging memory, advanced packaging, energy storage, and even space exploration. 

Our μDALP technology facilitates rapid prototyping and manufacturing for a multitude of applications, ranging from sensors (temperature, pressure, gas sensing, and capacitive) to optics, exhibiting sensitivities that equal or surpass those of devices manufactured using traditional vapor phase deposition techniques, while also allowing processing on intricate surfaces and various materials. Moreover, the accelerated localized processing enabled by our technology paves the way for design ingenuity and optimization unattainable with other thin film deposition methods and lithography. 

This presentation seeks to foster collaboration and inspire discussion with Argonne National Lab’s esteemed nanomaterials and nanodevices researchers, exploring the opportunities and challenges that lie ahead in our mutual pursuit of advanced materials and devices development for various applications. By joining forces, we can unleash the full potential of our technology and contribute to breakthroughs that push the boundaries of what is possible in modern technology.