- Atomic layer deposition (ALD) was used to probe the differences in surface chemistry of diamond 001 terminations for the first time.
- This technique can be used both as an analytical technique to give information about surface chemistry and as a deposition/passivation method.
Significance and Impact
- Diamond surface termination is extremely important for quantum sensing and device integration.
- This work paves the way for a facile termination characterization methodology as well as in-situ quantum relevant surface passivation schemes.
- ALD is gas-solid surface reactions, here the reactivity surface terminations can be modified in situ or probed by the deposition of Al2O3 on the diamond surface.
- In-situ treatments had significantly altered surface chemistry as demonstrated by the effect on nucleation of material on the surface.
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