Inclusion of diffuse nitrogen ion plasma into sputtering of Niobium was found to produce Niobium Nitride thin films with superior superconducting properties on non-epitaxial substrates.
Significance and impact
Capability to produce high quality nitride thin films opens up possibilities to use high-speed superconducting detectors in nuclear physics that were previously thought to be impossible.
- Presence of nitrogen ion beam during deposition process allows for more control of deposition kinematics
- Nitride films are now possible to deposit at room temperatures and on conventional silicon or oxide wafers
- Films are etched into superconducting nanowire detectors
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