Jeff Elam leads Argonne National Laboratory’s Functional Coatings Group in the Applied Materials division. The group develops coating technologies for a diverse range of applications including energy storage, photodetectors, and water purification. He has won five R&D 100 Awards and holds numerous patents.

Awards, Honors, and Memberships

• R&D 100 Award, GreenTech Gold Award, and Editor’s Choice Award (2017) ​“Oleo Sponge”
• R&D 100 Award (2014) ​“SIS Lithography”
• R&D 100 Award (2013) ​“Charge Drain Coatings”
• R&D 100 Award (2012) ​“Large Area Microchannel Plates”
• R&D 100 Award (2008) ​“UNCD Mechanical Seals”
• ALD Innovation Award, 2017
• AVS Fellow, 2018
• Argonne Center for Electrical Energy Storage (CEES); Advanced Materials for Energy-Water Systems (AMEWS) Center; Northwestern Argonne Institute for Science and Engineering (NAISE)

Selected Publications

• Anil U. Mane, Steven Letourneau, David J. Mandia, Jian Liu, Joseph A. Libera, Yu Lei, Qing Peng, Elton Graugnard, and Jeffrey W. Elam, ​“Atomic Layer Deposition of Molybdenum Disulfide Films Using MoF₆ and H₂S”, J. Vac. Sci. Technol. A 36(1), 01A125-1 - 01A125-9 (2018). DOI: 10.1116/1.5003423.
• Edward Barry, Joseph A. Libera, Anil U. Mane, Jason R. Avila, David DeVitis, Keith Van Dyke, Jeffrey W. Elam, and Seth B. Darling, ​“Mitigating Oil Spills in the Water Column”, Environmental Science: Water Research & Technology, 4, 40-47, (2018). DOI: 10.1039/c7ew00265c.
• E. Barry, A. U. Mane, J. A. Libera, J. W. Elam, and S. B. Darling, ​“Advanced Oil Sorbents Using Sequential Infiltration Synthesis”, Journal of Materials Chemistry A, 5, 2929-2935, (2017). DOI: 10.1039/c6ta09014a .
• Lin Chen, Zhennan Huang, Reza Shahbazian-Yassar, Joseph A. Libera, Kyle C. Klavetter, Kevin R. Zavadil, and Jeffrey W. Elam, ​“Directly Formed Alucone on Lithium Metal for High-Performance Li Batteries and Li–S Batteries with High Sulfur Mass Loading”, Advanced Energy Materials, ASAP, (2017), DOI:  10.1021/acsami.7b15879 .
• S. Babar, A. U. Mane, A. Yanguas-Gil, E. Mohimi, R. T. Haasch, and J. W. Elam, ​“W:Al2O3 Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition”, J. Phys. Chem. C, 120 (27), 14681–14689, (2016). DOI: 10.1021/acs.jpcc.6b03823.
• J. Lu, J. W. Elam, and P. C. Stair, ​“Atomic Layer Deposition—Sequential Self-limiting Surface Reactions for Advanced Catalyst ​“bottom-up” Synthesis”, (Invited Review), Surface Science Reports, 71, 410-472, (2016). DOI: 10.1016/j.surfrep.2016.03.003.
• Y. Cao, X. Meng, and J. W. Elam, ​“Atomic Layer Deposition of Li_xAl_yS Solid State Electrolytes for Stabilizing Lithium Metal Anodes”, ChemElectroChem, 3, 858-863, (2016), DOI: 10.1002/celc.201600139.
• J. A. Klug, M. S. Weimer, J. D. Emery, A. Yanguas-Gil, S. Seifert, C. M. Schleputz, A. B. F. Martinson, J. W. Elam, A. S. Hock, and T. Proslier, ​“A Modular Reactor Design for in situ Synchrotron X-ray Investigation of Atomic Layer Deposition Processes”, Review of Scientific Instruments, 86, 113901, (2015), DOI: 10.1063/1.4934807.
• M. Biswas, J. A. Libera, S. B. Darling, and J. W. Elam, ​“Kinetics for the Sequential Infiltration Synthesis of Alumina in 2 Poly(methyl methacrylate): An Infrared Spectroscopic Study”, Journal of Physical Chemistry C, 119, 14585-14592, (2015), DOI:10.1021/jp511939j.
• C. P. Canlas, J. Lu, N. Ray, N. Grosso-Giordano, S. Lee, J. W. Elam, R. E. Winans, R. P. Van Duyne, P. C. Stair, and J. M. Notestein, ​“Shape-Selective Sieving Layers on an Oxide Catalyst Surface”, Nature Chemistry, 4, 1030-1036 (2012).
• Y.-C. Tseng, A. U. Mane , J. W. Elam , and S. B. Darling, ​“Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early”, Advanced Materials, 24, 2608-2613, (2012).
• J. Lu, B. Fu, M. C. Kung, G. Xiao, J. W. Elam, H. H. Kung, and P. C. Stair, ​“Coking and Sintering Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition”, Science, 335, 1205 (2012).
• Y.-C. Tseng, Q. Peng, L. Ocola, J. W. Elam, and S. B. Darling, ​“Enhanced Block Copolymer Lithography U.S.ing Sequential Infiltration Synthesis”, J Phys Chem C., 115(36) 17725-17729 (2011).
• A. Yanguas-Gil and J. W. Elam, ​“Controlled dopant distribution and higher doping efficiencies by surface-functionalized atomic layer deposition”, Chemistry of Materials, 23 (19), 4295-4297, (2011).
• S. T. Christensen and J. W. Elam, ​“Atomic layer deposition of Ir-Pt alloy films”, Chemistry of Materials, 22, 2517–2525, (2010).

Selected Patents

• Jeffrey W. Elam, and Angel Yanguas-Gil, ​“FAST METHOD FOR REACTOR AND FEATURE SCALE COUPLING IN ALD AND CVD MODELS”, US Patent Number 9,727,672.
• J. Elam and X. Meng, ​“Materials for Solid State Electrolytes and Protective Electrode Coatings for Lithium Batteries”, US Patent Number 9,917,295.
• A. Yanguas-Gil, J. A. Libera, and J. W. Elam, ​“Method for continuous ALD”, US Patent Number 9,598,769.
• S. B. Darling, J. W. Elam, and Y.-C. Tseng, ​“SEQUENTIAL INFILTRATION SYNTHESIS FOR ENHANCING MULTIPLE-PATTERNING LITHOGRAPHY”,  US Patent Number 9,684,234.
• A. B. F. Martinson, J. A. Libera, J. W. Elam, and S. Riha, ​“MICRO-BALANCE SENSOR INTEGRATED WITH ATOMIC LAYER DEPOSITION CHAMBER”, US Patent Number 9,856,563.
• A. U. Mane and J. W. Elam, ​“Tunable Resistance Coatings”, US Patent Number 8,921,799.
• A. Yanguas-Gil and J. W. Elam, ​“Growth Rate Control in ALD by Surface Functionalization”, US Patent Number 8,951,615.
• Q. Peng, S. B. Darling, Y.-C. Tseng, J. W. Elam, ​“Ordered Nanoscale Domains by Infiltration of Block Copolymers”, US Patent Number 9,487,600.
• A. U. Mane, Q. Peng, and J. W. Elam, ​“Microchannel Plate Detectors and Methods for Their Fabrication”, US Patent Number 8,969,823.

Education

• Senior Research Associate, University of Colorado
• Ph.D., Physical Chemistry, University of Chicago
• B.A. Chemistry, Cornell University