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Jeffrey A. Klug

Assistant Physicist

Biography

Selected Publications:

  • Performance and Ongoing Development of the Velociprobe, a Fast Hard X-ray Nanoprobe for High- Resolution Ptychographic Imaging”, J. A. Klug, J. Deng, C. Preissner, C. Roehrig, S. T. Mashrafi, M. Wang, Z. Feng, M. Wojcik, M. Wyman, K. Lang, Z. Cai, B. Lai, and S. Vogt, Microscopy and Microanalysis, 24, 54 (2018).

  • Superconducting Energy Scales and Anomalous Dissipative Conductivity in Thin Films of Molybdenum Nitride”, J. Simmendinger, U. S. Pracht, L. Daschke, Th. Proslier, J. A. Klug, M. Dressel, and M. Scheffler, Phys. Rev. B 94, 064506 (2016).

  • A Modular Reactor Design for In Situ Synchrotron X-ray Investigation of Atomic Layer Deposition Processes”, J. A. Klug, M. S. Weimer, J. D. Emery, A. Yanguas-Gil, S. Seifert, C. M. Schlepütz, A. B. F. Martinson, J. W. Elam, A. S. Hock, and Th. Proslier, Rev. Sci. Instrum., 86, 113901 (2015).

  • Tunneling Spectroscopy of Superconducting MoN and NbTiN Grown by Atomic Layer Deposition”, N. R. Groll, J. A. Klug, C. Cao, S. Altin, H. Claus, N. G. Becker, J. F. Zasadzinski, M. J. Pellin, and Th. Proslier, Appl. Phys. Lett., 104, 092602 (2014).

  • Heteroepitaxy of Group IV-VI Nitrides by Atomic Layer Deposition”, J. A. Klug, N. G. Becker, N. R. Groll, C. Cao, M. S. Weimer, M. J. Pellin, J. F. Zasadzinski, and Th. Proslier, Appl. Phys. Lett. 103, 211602 (2013).

  • Low Temperature Atomic Layer Deposition of Highly Photoactive Hematite Using Iron(III) Chloride and Water”, J. A. Klug, N. G. Becker, S. C. Riha, A. B. F. Martinson, J. W. Elam, M. J. Pellin, and Th. Proslier, J. Mater. Chem. A 1, 11607 (2013).

  • Measuring Roughness of Buried Interfaces by Sputter Depth Profiling”, S. V. Baryshev, J. A. Klug, A. V. Zinovev, C. E. Tripa, J. W. Elam, and I. V. Veryovkin, Nanotechnology, 24, 015708 (2013).

  • Atomic Layer Deposition of Amorphous Niobium Carbide-Based Thin Films”, J. A. Klug, Th. Proslier, J. W. Elam, R. E. Cook, J. M. Hiller, H. Claus, N. G. Becker, and M. J. Pellin, J. Phys. Chem. C 115, 25063 (2011).

  • Elastic Relaxation and Correlation with Ferroelectric Domains in Epitaxial Patterned (001) BiFeO3Nanostructures”, J. A. Klug, M. V. Holt, R. N. Premnath, A. Joshi-Imre, S. Hong, R. S. Katiyar, M. J. Bedzyk, and O. Auciello, Appl. Phys. Lett. 99, 052902 (2011).

  • Atomic Layer Deposition and Superconducting Properties of NbSi Films”, Th. Proslier, J. A. Klug, J. W. Elam, H. Claus, N. G. Becker, and M. J. Pellin, J. Phys. Chem. C 115, 9477 (2011).

  • Effects of Cantilever Buckling in Piezoresponse Force Microscopy Imagining of Ferroelectric Domains in BiFeO3Nanostructures”, R. Nath, S. Hong, J. A. Klug, A. Imre, M. J. Bedzyk, R. S. Katiyar, and O. Auciello, Appl. Phys. Lett. 96, 163101 (2010).

  • A Ferroelectric Oxide Made Directly on Silicon”, M. P. Warusawithana, C. Cen, C. R. Sleasman, J. C. Woicik, Y. Li, L. Fitting Kourkoutis, J. A. Klug, H. Li, P. Ryan, L.-P. Wang, M. Bedzyk, D. A. Muller, L.-Q. Chen, J. Levy, and D. G. Schlom, Science 324, 367 (2009).

  • Nanoscale Piezoresponse Studies of Ferroelectric Domains in Epitaxial BiFeO3Nanostructures”, S. Hong, J. A. Klug, M. Park, A. Imre, M. J. Bedzyk, K. No, A. Petford-Long, and O. Auciello, J. Appl. Phys. 105, 061619 (2009).

  • Hydration and Reduction of Molecular Beam Epitaxy Grown VOx/α-Fe2O3(0001): Ambient Pressure Study”, C.-Y. Kim, J. A. Klug, P. C. Stair, and M. J. Bedzyk, J. Phys. Chem. C 113, 1406 (2009).