Koichi Tanaka
Assistant Materials Scientist
Biography
Koichi is an assistant scientist in the Materials Science Division at Argonne National Laboratory. Koichi graduated with bachelor’s and master’s degrees from Institute of Science Tokyo, Japan (formerly Tokyo Institute of Technology) and received his Ph.D. degree from the University of California Los Angeles (UCLA) in 2020 for his work on microstructural evolution of transition metal carbide thin films on single-crystalline surfaces. Before joining UCLA, he worked at Mitsubishi Materials Corporation in Japan, where he acquired technical skills on various vacuum deposition systems.
Koichi’s current research interests include thin film growth, crystallization, area-selective materials synthesis, heterolayered and multilayered materials, plasma deposition processes, materials characterization, and instrumentation of high and ultra-high vacuum systems.
Selected publications:
- Koichi Tanaka, Xella Doi, Connor P. Horn, Chloe I. Tsang, Supratik Guha, “Orientation-tunable local crystallization of Si films enabled by atomic imprint crystallization” Appl. Phys. Lett. 128 (13), 131909 (2026) DOI: 10.1063/5.0323109
- Koichi Tanaka, Hicham Zaid, Toshihiro Aoki, Aditya Deshpande, Koki Hojo, Cristian V. Ciobanu, Suneel Kodambaka, “Growth of Highly Oriented (VNbMoTaW)S2 Layers” Nano Letters 24 (1), 493-500 (2024) DOI: 10.1021/acs.nanolett.3c04521
- Koichi Tanaka, Liang Han, Xue Zhou and André Anders, “Adding high time resolution to charge-state-specific ion energy measurements for pulsed copper vacuum arc plasmas” Plasma Sources Sci. Technol. 24, 045010 (2015) DOI: 10.1088/0963-0252/24/4/045010