2020 APS/CNM Joint Virtual Workshops
Many of the workshops and short courses that had been planned for this year’s APS/CNM Users Meeting, which was cancelled due to the COVID-19 outbreak, were held virtually later in the year. The workshops and short courses, held August 24 - September 4, 2020, were hosted via a video conferencing application called BlueJeans.
CNM EVENTS PRESENTED BY DATE
Monday, August 24
8:30 a.m. - 12:00 p.m.
Joint APS/CNM Workshop
Advances in Phase Retrieval Methods for High-Resolution X-ray Imaging (PART ONE)
Co-organizers: Saugat Kandel (Northwestern University), Siddharth Maddali (ANL/MSD), and Ming Du (APS)
Tuesday, August 25
8:30 a.m. – 11:45 a.m
Joint APS/CNM Workshop
Advances in Phase Retrieval Methods for High-Resolution X-ray Imaging (PART TWO)
Co-organizers: Saugat Kandel (Northwestern University), Siddharth Maddali (ANL/MSD), and Ming Du (APS)
Wednesday, August 26
8:30 a.m. – 10:00 a.m.
CNM Short Course
Thin Film Deposition Overview
Instructor: Liliana Stan
Description: This course is designed as an introduction to fundamental concepts and operating principles for the deposition of thin films by physical vapor deposition or chemical methods, providing a broad overview of thin film deposition methods, their advantages and limitations. Understanding that all methods have their specific limitations and involve compromises with respect to process specifics and substrate material, helps determining the methods that are suitable for achieving the expected film properties. Deposition methods that are available at the Center for Nanoscale Materials (CNM) - sputtering, evaporation, ALD, and CVD - will be disused in more detail.
Wednesday, August 26
1:00 p.m. – 3:00 p.m.
CNM Short Course
Fundamentals of High Aspect Ratio Pattern Transfer by Deep Reactive Ion Etching (DRIE) Processes
Instructor: Ralu Divan
Lecturer: Dr. Pratik Kothary (PlasmaTherm)
Description: This course will discuss and demonstrate pattern transfer by dry etch DRIE. The applications of these processes are the transfer of 2D patterns in thin films and substrates and the micro- and nanofabrication of 3D structures in substrates. This course will also present new complementary technologies such as Fast Atomic Sequential Technology (FAST) and stripping and cleaning technologies.
Tuesday, September 1
1:30 p.m. – 5:00 p.m.
Joint APS/CNM Workshop
Autonomous Control of Experiments in the Microscopes and Light Sources of the Future (PART ONE)
Co-organizers: Mathew Cherukara and Subramanian Sankaranarayanan (CNM), Nicholas Schwarz and Chengjun Sun (APS)
Wednesday, September 2
1:30 p.m. – 5:00 p.m.
Joint APS/CNM Workshop
Autonomous Control of Experiments in the Microscopes and Light Sources of the Future (PART TWO)
Co-organizers: Mathew Cherukara and Subramanian Sankaranarayanan (CNM), Nicholas Schwarz and Chengjun Sun (APS)