Record-Low Contact Resistance in Diamond Electronics
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Scientific Achievement
Researchers demonstrated ohmic contacts with record-low specific contact resistivity using a Ti/Pt/Au metal stack on n-UNCD films. The superior performance is attributed to the formation of titanium carbide layer and negligible intermetallic diffusion at temperatures as high as 800℃.
Significance and Impact
This approach enables more efficient, thermally stable diamond-based electronics for high-power, high-frequency, and radiation-resilient applications that also demand efficient heat management.
Research Details
- All work was carried out at the CNM including n-UNCD film growth, device fabrication, electrical characterization, and analysis.
DOI: 10.1063/5.0286190
About Argonne’s Center for Nanoscale Materials
The Center for Nanoscale Materials is one of the five DOE Nanoscale Science Research Centers, premier national user facilities for interdisciplinary research at the nanoscale supported by the DOE Office of Science. Together the NSRCs comprise a suite of complementary facilities that provide researchers with state-of-the-art capabilities to fabricate, process, characterize and model nanoscale materials, and constitute the largest infrastructure investment of the National Nanotechnology Initiative. The NSRCs are located at DOE’s Argonne, Brookhaven, Lawrence Berkeley, Oak Ridge, Sandia and Los Alamos National Laboratories. For more information about the DOE NSRCs, please visit https://science.osti.gov/User-Facilities/User-Facilities-at-a-Glance.
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